International Conference on Microelectronics and Nanotechnology ICMN on January 07-08, 2026 in Tokyo, Japan

Microelectronic Device Processing and Process Integration
Microelectronic Device Electrical and Reliability Testing
Semiconductor Packaging and Reliability
Microelectronic Circuit Design
MEMS and Nanoelectronic Devices
DUV, immersion, EUV and X-ray lithography
Electron and ion beam lithography
Sub-half wavelength "super resolution" optical lithography
Photon- and charged-particle optics
Metrology and alignment
Resists and resist processing
Plasma etching and deposition
Nano-fabrication techniques
Maskless Lithography
Nanoelectronics
Nanomagnetic devices
Novel ultrahigh density data storage devices
Nanoparticle synthesis and assembly
Nanofabrication for energy sources
Atomic and Molecular manipulation
Optical tweezers
Simulation and computer aided design for the Nanoscale Era
Nanometer scale photonic devices
Molecular and low-dimensional nano-electronics
Bio-nanotechnology & hybrid bio/solid state devices
Micro and nano-scaled MEMS
Nano-particle, synthesis and assembly
Self-assembly and directed self-assembly
Nanoimprint lithography, embossing and soft lithography
Nanofabrication for energy sources
Lithography and Related Technologies
DUV, VUV, EUV Lithography and Metrology
Electron and Ion Beam Lithography
Resist Materials and Processing
Nanotechnology
Nanodevices
Nanofabrication
Nanomaterials
Nano-Tools
Nanoimprint, Nanoprint and Rising Lithography
Bio MEMS, Lab on a Chip
Microsystem Technology and MEMS